Efficacy and Safety of a 1064-nm Nd:YAG Picosecond Laser Versus a 1927-nm Fractional Laser for Atrophic Acne Scars.

Xi'an Jiaotong University

Status: Completed

Conditions: Acne Scar; Acne Scars - Atrophic

Treatments: Device: 1064-nm Nd:YAG Picosecond Laser; Device: 1927-nm Fractional Thulium Laser

Study type: Interventional

Funder types: Other

Identifiers

NCT07153679

2021013

Details and patient eligibility

About

Atrophic acne scars are common disfiguring skin problems, especially in the Asian population prone to Post-inflammatory Hyperpigmentation (PIH), and their treatment is highly challenging. 1064 nm microlens array picosecond laser (P-MLA) based on optomechanical effect and 1927 nm segmented thulium laser (FTL) based on photothermal effect are two emerging therapeutic techniques, but there is a lack of strict clinical evidence for direct comparison in the Asian population. This study aims to directly compare the clinical efficacy, safety and tolerability of 1064 nm P-MLA and 1927 nm FTL in the treatment of atrophic acne scars in the Asian population through a randomized, half-face controlled, evaluator blind trial.

Enrollment: 38 patients

Sex: All

Ages: 18 to 40 years old

Volunteers: No Healthy Volunteers

Inclusion criteria

• Aged between 18 and 40.
• Symmetrical atrophic acne scars on both sides of the face.

Exclusion criteria

• Uncontrolled active acne.
• Pregnant and lactating women.
• Infectious skin diseases at the treatment site.
• Have taken retinoid drugs orally within the past 6 months.
• Photosensitive individuals or those who have used photosensitive drugs within 2 weeks.
• Keloid constitution.

Trial design

Primary purpose: Treatment

Allocation: Randomized

Interventional model: Factorial Assignment

Masking: Double Blind

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38 participants in 2 patient groups

1064-nm Nd:YAG Picosecond Laser Group

Experimental group

Description:

1064-nm Nd:YAG Picosecond Laser Device (Picocare 450, WONTECH, Daejeon, South Korea)

Treatment:

Device: 1064-nm Nd:YAG Picosecond Laser

1927-nm Fractional Thulium Laser Group

Experimental group

Description:

1927-nm Fractional Thulium Laser Device (Lavieen, WONTECH, Daejeon, South Korea)

Treatment:

Device: 1927-nm Fractional Thulium Laser