Influence of the Sinus Floor-to-lower Window Margin Distance on Outcomes of Bone Window Repositioning in Lateral Sinus Floor Elevation With Simultaneous Implant Placement

Guoli Yang

Status: Completed

Conditions: Sinus Floor Elevation

Study type: Observational

Funder types: Other

Identifiers

NCT07045389

2024-204R

82271001 ( 82370991; 2022KY872;Other Grant/Funding Number)

Details and patient eligibility

About

The goal of this observational study is to evaluate how the vertical distance from the sinus floor to the lower margin of the lateral window affects bone regeneration and implant outcomes after lateral sinus floor elevation with simultaneous implant placement. The main question it aims to answer is:

Does a sinus floor-to-window margin distance ≥3 mm lead to better bone augmentation and implant stability compared to a distance <3 mm?

This is a retrospective, single-center cohort study. Participants included patients who had previously undergone lateral sinus floor elevation with implant placement and had at least 6 months of postoperative follow-up. Cone-beam CT images were used to measure radiographic outcomes such as alveolar bone height and augmented volume.

Enrollment: 47 patients

Sex: All

Ages: 18 to 80 years old

Volunteers: No Healthy Volunteers

Inclusion criteria

• Age ≥ 18 years
• Received lateral sinus floor elevation with bone window repositioning and simultaneous implant placement (LSFE with BWR and SIP) between 2019 and 2024
• No contraindications to implantation
• Complete medical and radiographic records available

Exclusion criteria

• Uncontrolled systemic diseases
• Incomplete medical or surgical records
• Missing preoperative or postoperative imaging data

Trial design

47 participants in 2 patient groups

DSLW ≥ 3 mm

Description:

Patients undergoing lateral sinus floor elevation with simultaneous implant placement, in whom the distance from the sinus floor to the lower edge of the lateral window is greater than or equal to 3 mm.

DSLW < 3 mm

Description:

Patients undergoing lateral sinus floor elevation with simultaneous implant placement, in whom the distance from the sinus floor to the lower edge of the lateral window is less than 3 mm.